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Ralfy Kenaz
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Student |
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Israel |
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| The Hebrew University of Jerusalem |
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| I am a PhD candidate who developed a novel system and method for performing spectroscopic ellipsometry measurements in an optical microscope geometry [1]. Our instrument has advantages of sub-5 microns lateral resolution and record-fast data acquisition, overcoming the limitations of state-of-the-art ellipsometers in addressing microstructures [2]. Our micro-ellipsometer was successfully used for measuring the thicknesses and consequently the number of atomic layers of exfoliated 2D material flakes with angstrom-level precision [3], showcasing the potential of the system to be used for investigation of 2D materials and their heterostructures.
[1] R. Kenaz and R. Rapaport. U.S. Patent 11,262,293 B2 (2022).
[2] R. Kenaz and R. Rapaport. Review of Scientific Instruments 94 (2), 023908 (2023).
[3] R. Kenaz et al., ACS Nano 17 (10), 9188–9196 (2023). |
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| Activity Area: |
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| - | Characterization techniques (AFM, SPM, TEM, etc.) |
| - | Nanophotonics and optoelectronics |
| - | Other two-dimensional materials |
| - | Photonics and plasmonics |
| - | Thin films and devices |
| - | Spectroscopic ellipsometry |
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| Optics, ellipsometry, AFM, Raman, cryogenics |
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| A high lateral resolution Spectroscopic Micro-Ellipsometer for fast and accurate optical investigation of 2D materials and their heterostructures. |
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Participants: 50
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Meetings: 19
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