Oral Contributions / Industrial Day
DeWolf	Peter	Veeco (France)
"Scanning Probe Microscopy based NanoLithography"
Gil	Adriana	Nanotec S.L. (Spain)
"SPM's lithographic tools: a wide field for custom-made experiments"
Heidari	Babak	Obducat AB (Sweden)
"Imprint Lithography, Industrial Perspective"
Kada	Gerald	Molecular Imaging (USA)
"Atomic Force Microscopy (AFM) Applications for Nanotechnology"
Kuehnholz	Joerg	SUSS MicroTec (France)
"Costs saving with micro/nano replication"
Kuschnerus	Peter	Carl Zeiss NTS GmbH (Germany)
"New electron-beam based photomask repair tool"
Loeschner	Hans	IMS Nanofabrication GmbH (Austria)
"E-beam Projection Mask-Less Lithography (PML2)"
Maier	Markus	Omicron Nanotechnology GmbH (Germany)
"Ultimate Nanoprobing in UHV: Four independent Scanning Tunneling Microscopes navigated by high resolution UHV SEM"
Villaret	Alexandre	ST Microelectronics (France)
Nouvertne	Frank	Raith GmbH (Germany)
"Fabrication of 3D structures in SU-8 resist using an E-Beam lithography system and 3LITH calculation and simulation tool"
Reng	Norbert	Carl Zeiss NTS GmbH (Germany)
"Nano imprint lithography for manufacturing nano scale feature sizes"

 

Oral Contributions
Aassime	Abdelhanin	Universite Paris Sud (France)
"Fabrication optimized sub-40nm planar patterning process for a fully spin-polarized magnetic memory"
Ahopelto	Jouni	VTT (Finland)
"Emerging Nanopatterning Methods - NAPA"
Chichkov	Boris	Laser Zentrum Hannover (Germany)
"Non-linear optical lithography for 3D nanofabrication"
Csaki	Andrea	IPHT (Germany)
"DNA-based construction for nanoelectronics"
De Boeck	Jo	IMEC (Belgium)
Faucher	Marc	CEA-LETI (France)
"AFM Lithography and its application to metal based quantum devices"
Gallo	Pascal	LAAS/CNRS (France)
"Epoxy-siloxane low viscosity pre-polymer for nanoimprint process"
Ghibaudo	Gerard	IMEP-ENSERG (France)
"SINANO: silicon-based nanodevices - European Network of Excellence on the 6th Framework Programme"
Groening	Oliver	Swiss Federal Laboratories for Materials Testing & Research (Switzerland)
"Resistor limited electron field emission in regular oriented carbon nanotubes arrays"
Latyshev	Alexander	Institute of Semiconductor Physics SB RAS (Russia)
"Complex modification of surface by AFM probe: "Tine&Memo" technique"
Lenfant	Stephane	IEMN/MCMO (France)
"Self-assembled molecular diodes on silicon"
Marks	Robert	Ben-Gurion University of the Negev (Israel)
"Enzyme Nanolithography"
Pain	Laurent	CEA/LETI (France)
"Electron beam direct write lithography for semiconductor manufacturing: solution to anticipate architecture development for 32nm node and below"
Polonski	Vitali	Commonwealth Scientific & Industrial Research Organisation (CSIRO) (Australia)
"Nanophotonics-derived methods of fabrication"
Rojo-Romeo	Pedro	Ecole Centrale de Lyon (France)
"InP surface patterning to localize InAs quantum dots"
Tranvouez	Edern	LPM (France)
"InP patterning: Comparison between contact and non contact mode in AFM local anodisation"
Vidal	Bernard	L2MP / CNRS (France)
"Optics development in French (PREUVE) and European EUV Program (MEDEA); Application of Multilayer Coatings necessary in demonstrative tools"

 

Oral Contributions - Working Groups
Folsch	Stefan	Paul-Drude Institut for Solid State Electronics (Germany)
"Assembly of surface-supported metallic quantum wires and their interactionwith single organic molecules"
Gourdon	Andre	CEMES/CNRS (France)
"Mono-Molecular Electronics: a chemist's view"
Guedj	David	EC - IST/FET (Belgium)
Meyer	Gerhard	IBM Zurich (Switzerland)
"STM investigations on the adsorption and manipulation of metal atoms on ultrathin insulating films"

 

Posters
Abed	Hichem	CRMCN (France)
"Deposition of gold nanostructures by field induced deposition using a gold coated metal STM tip"
Arnal	Thomas	IEMN (France)
"Fabrication optimized sub-40nm planar patterning process for a fully spin-polarized magnetic memory"
Baraton	Laurent	CEA/DSM/DRECAM/SPCSI (France)
"Integration of molecules on a chip: from the Si-H surface chemistry to nanometer sized diodes"
Desbief	Simon	L2MP/CNRS (France)
"Formation of nano domains in Alkyltrichlorosilane self-assembled monolayers deposited on silicon: application to molecular electronics"
Egbert	Andre	phoenix|euv Systems + Services GmbH (Germany)
"Debris-free EUV source for at-wavelength metrology"
Gillet	Marcel	L2PM (France)
"Formation and structure of tungsten oxide nanorods"
Gourgon	Cecile	LTM/CNRS (France)
"Nanoimprint lithography on 8" wafers: resolution and uniformity"
Guerin	David	IEMN (France)
"Silicon-molecule-metal junctions by nanotransfer printing: chemical synthesis and electrical properties"
Mills	Chris	Barcelona Science Park (Spain)
"Polymeric systems for biomedical applications using nanoimprint lithography"
Mollard	Laurent	CEA/D2NT/LLIT (France)
"Electron beam exposure to localise silicon nano-crystals nucleation"
"100KeV and 50 KeV electron beam nanolithography processes comparison"
Prestigiacomo	Morgane	CRMCN (France)
"Chemical and electrical characterizations of deposits elaborated by focused ion beam assisted deposition"
Rochdi	Nabil	CRMCN (France)
"Electrical characteristics of silicon nanowires fabricated on thinned SOI samples by AFM lithography"
Sarraf	Hamid	Institute of Chemical Technology (Czech Republic)
"Advanced colloidal processing for preparation of nano-composites by spin coating process"
Turala	Artur	Ecole Centrale Lyon (France)
"InP surface patterning to localise InAs quantum dots"