Untitled Document
Organised by:
PHANTOMS Foundation
CRMCN
CEA-LETI
VTT
 
In association with:
NaPa Integrated Project
Network of Excellence in the area of Nanophotonics and Molecular Photonics
 
Programme  
Last Updated 21 September, 2006

LITHO2006 / June 26-30, 2006 / Scientific Programme


Scientific Programme - Monday 26
 
08:00 - 09:00 Registration
09:00 - 09:40 Stephen Y. Chou (Princeton University, USA):"Nanoimprint lithography: Technology, Applications and Commercialization - Today and Future"
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09:40 - 10:00 Marko Vogler (Micro Resist Technology GmbH, Germany): "UV-curable Polymer Systems Tailored for UV-nanoimprint Lithography - Needs and Developments"
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10:00 - 10:20 Jukka Viherala (TU Tampere, Finland): "Nanoimprint lithography on very small substrate: Fabrication of diffractive optical element on a facet of single-mode optical fiber"
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10:20 - 10:40 Massimiliano Cavallini (CNR-ISMN, Italy): "Unconventional Bottom-Up approach to Nanofabrication of Functional Materials"
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10:40 - 11:10 Coffee Break - Exhibition
11:10 - 11:50 Alexander Latyshev (Russian Academy of Science, Russia): "AFM Based Diagnostic and Lithography of Semiconductor Nanostructures"
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11:50 - 12:10 Antonio Garcia-Martin (IMM-CSIC, Spain): "Formation of nanoscale liquid menisci in Electric Fields and Nanofabrication"
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12:10 - 12:30 Hichem Abed (CRMCN/CNRS, France): "Connected Silicon Nanowire Fabrication from CVD
of Silane"
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12:30 - 14:00 Lunch
14:00 - 14:40 Serge Tedesco (CEA, France): "Lithography Roadmap for CMOS manufacturing"
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14:40 - 15:20 Boris Chichkov (Laser Zentrum Hannover e.V., Germany): "Maskless, nonlinear, direct-write femtosecond laser lithography and applications"
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15:20 - 16:20 Coffee Break - Exhibition
16:20 - 17:00 Hervé Dallaporta (CRMCN/CNRS, France): "Building nanoobject using phenanthrene decomposition induced by focused ion beam"
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17:00 - 17:20 Jacques Gierak (LPN-CNRS, France): "Low dose and highly selective patterning with Focused Ion Beams"
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17:20 - 17:40 Anna Vilá (University of Barcelona, Spain): "Focused ion beam for charge transport characterization along Si and SiC nanocrystals in SiO2"
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17:40 - 18:00
Laurent Roussel (FEI Company, Netherlands): "Nanoprototyping and Nanofabrication using Focused Ion Beam (FIB) and DualBeam Technologies"
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19:30
Welcome Reception - Palais du Pharo

Scientific Programme - Tuesday 27
 
09:00 - 09:40 Viatcheslav Safarov (CRMCN/CNRS, France): "Semiconductor Spintronics"
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09:40 - 10:20 Eric Minoux (THALES, France): "Electron sources based on carbon nanotubes - application to microwave amplifiers"
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10:20 - 11:10 Coffee Break - Exhibition
11:10 - 11:50 Christophe Constancias (CEA-LETI, France): "EUV Lithography at CEA-LETI"
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11:50 - 12:10 Pauline Voisin (LTM-CNRS, France): "UV-Nanoimprint process using home-developed resist and multi-scale molds"
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12:10 - 12:30 Jamal Tallal (LTM-CNRS, France): "NIL for dielectrophoresis integration of gold colloids"
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12:30 - 14:00 Lunch
14:00 - 14:40 Dietmar Pum (Center of Nanobiotechnology, Austria): "S-layer based nanostructures"
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14:40 - 15:20 Paolo Facci (S3-INFM-CNR, Italy): "Bio-inspired molecular nanoelectronics"
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15:20 - 15:40 Anne Charrier (CRMCN/CNRS, France): "Label free bidimensional colorimetric sensor for the detection of DNA"
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15:40 - 16:00 Nan Wang (University of Oxford, UK): "Dynamic Characterization of Protein Electric Properties Associated with Structure Deformation by Conducting Atomic Force Microscopy"
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16:00 - 16:20 Ling Peng (CNRS, France): "How to Effectively Construct Nanoscale RNA/Dendrimer Complexes"
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16:30
Visit of "Frioul Islands"

Scientific Programme - Wednesday 28 (Industrial Day)
 
Network of Excellence in the area of Nanophotonics and Molecular Photonics
09:00 - 09:30 Gabriel Crean (Tyndall, Ireland): "From Science to Shares; Technology Transfer & Commercialisation Issues and NanoPhotonics Case Studies"
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09:30 - 10:00 Yong Chen (CNRS-LPN, France): "Integration of optofluidic and other functionalities"
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10:00 - 10:30 Leslie Carpenter (Dow Corning, UK): "Dow Corning's Take on Photonics"
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10:30 - 11:00
Coffee Break - Poster / Exhibition
11:00 - 11:30 Helmut Bechtel (PHILIPS): "Materials & Nano Optics for Solid State Lighting”
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11:30 - 12:00 Jouni Ahopelto (VTT, Finland): "New fabrication methods for photonics”
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12:00 - 12:30

Niko Moll (IBM, Switzerland):"Hybrid Photonic Nano-Structures for Lasing and Switching Applications”

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12:30 - 14:00
Lunch
14:00 - 14:30 Cefe Lopez (CSIC-ICMM, Spain): "Advanced 3D photonic crystals structures as challenges: Robot-aided manipulation selfassembly”
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14:30 - 15:00
Rosie Cush (Bookham, UK): "Advanced laser gratings: fabrication and assessment in the production environment"  
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15:00 - 15:30 Gonçal Badenes (ICFO, Spain): "Patterning of plasmonic structures for (bio) sensing"
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15:30 - 16:00 Coffee Break - Exhibition
 
16:00 - 16:40
Roel Gronheid (IMEC, Belgium): "Continued scaling in integrated circuits - Trends and requirements in Lithography"
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16:40 - 17:00
Paula Goldschmidt (INTEL, Ireland): "INTEL TME EMEA Operation - Making High Impact technologies happen"
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17:00 - 17:20
Jens Bolten (AMO GmbH, Germany): "Improving the Resolution Limit of Electron Beam Lithography"
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17:20 - 17:40
Frank Nouvertne (Raith GmbH, Germany): "Enabling new in-situ Nanofabrication Experiments using novel Electron and Ion-Beam Lithography and Nanoengineering Workstations"
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17:40 - 18:00
Pascal Gubbini (Molecular Imprints, France): "The Impact of Step and FlashTM Imprint Lithography for
Nano-manufacturing in Emerging Market Applications"
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21:00
Conference Dinner - Restaurant "Le Ruhl"

Scientific Programme - Thursday 29
 
NaPa Integrated Project
09:00 - 09:20 Jouni Ahopelto (VTT, Finland): "NaPa Integrated Project - Emerging Nanopatterning Methods"
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09:20 - 10:00 Helmut Schift (Paul Scherrer Institut, Switzerland): "Nanoimprint in NaPa: Diversity in Materials, Processes and Applications"
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10:00 - 10:20 Vincent Reboud (Tyndall National Institute, Ireland): "Spontaneous emission control of colloidal nanocrystals using nanoimprinted photonic crystals"
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10:20 - 11:10 Coffee Break - Exhibition
11:10 - 11:30 Tapio Makela (VTT Micro and Nanoelectronics, Finland): "Roll to roll nanoimprinting of conducting polyaniline using a novel imprinting device"
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11:30 - 11:50 Mathis Riele (University of Glasgow, UK): "Nanotopography for cell- and tissue engineering"
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11:50 - 12:10 Rasmus Haugstrup Pedersen (MIC, Denmark): "Long-Range Surface Plasmon Polariton Devices Fabricated by Nanoimprint Lithography"
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12:10 - 12:30 Anders Kristensen (MIC, Denmark): "Nanoimprint lithography fabrication of photonic crystal devices"
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12:30 - 14:00 Lunch
14:00 - 14:20 Ralph Werner (Nanoplus Nanosystems & Technologies, Germany): "Single-mode DBR laser Diodes for gas detection with Grating Structures fabricated by NIL"
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14:20 - 15:00 Heiko Wolf (IBM Research GmbH, Switzerland): "Particle Assembly and Transfer"
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15:00 - 15:20 Ulrich Plachetka (AMO GmbH, Germany): "Soft UV-Nanoimprint Lithography"
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15:20 - 16:00 Francesc Perez-Murano (IMB/CSIC, Spain): "Emerging Nanopatterning Methods based on MEMS Technology"
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16:00 - 17:00 Coffee Break - Exhibition

Scientific Programme - Friday 30
 
NaPa Integrated Project
09:00 - 09:40 Freimut Reuther (Micro Resist Technology GmbH, Germany): "Towards functional polymers for nanoimprint lithography – Strategies and achievements of the NaPa Materials subproject"
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09:40 - 10:00 Isabel Obieta (INASMET, Spain): "Plasma treatments of NIL polymers to enhance anti-adhesion properties"
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10:00 - 10:20 Maria Lucia Curri (IPCF, Italy): "Colloidal Nanoparticles: Novel Perspective for Nanopatterning"
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10:20 - 10:50 Coffee Break
10:50 - 11:30 David Mendels (NPL Management  Ltd, United Kingdom): "Multi-scale modelling of nano-imprint lithography"
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11:30 - 12:10 Gilbert Lecarpentier (SUSS MicroTec AG, Germany): "Nanoimprinting Stepper with Hot Embossing and UV-NIL Capability"
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12:10 - 12:50 Cornelis Wouter Hagen (Delft University of Technology - The Netherlands): "2-20 nm Lithography with Electron Beam Induced Deposition"
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12:50 - 13:00 Conclusions - LITHO2008 Announcement



© Phantoms Foundation 2006