Untitled Document
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Programme |
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Last Updated
21 September, 2006
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LITHO2006 / June 26-30, 2006 / Scientific Programme |
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Scientific Programme - Monday 26 |
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08:00 - 09:00 |
Registration |
09:00 - 09:40 |
Stephen Y. Chou (Princeton University, USA):"Nanoimprint lithography: Technology, Applications and Commercialization - Today and Future" |
K |
Abstract |
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Full presentation |
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09:40 - 10:00 |
Marko Vogler (Micro Resist Technology GmbH, Germany): "UV-curable Polymer Systems Tailored for UV-nanoimprint Lithography - Needs and Developments" |
O |
Abstract |
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Full presentation |
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10:00 - 10:20 |
Jukka Viherala (TU Tampere, Finland): "Nanoimprint lithography on very small substrate: Fabrication of diffractive optical element on a facet of single-mode optical fiber" |
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Abstract |
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Full presentation |
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10:20 - 10:40 |
Massimiliano Cavallini (CNR-ISMN, Italy): "Unconventional Bottom-Up approach to Nanofabrication of Functional Materials" |
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Abstract |
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Full presentation |
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10:40 - 11:10 |
Coffee Break - Exhibition |
11:10 - 11:50 |
Alexander Latyshev (Russian Academy of Science, Russia): "AFM Based Diagnostic and Lithography of Semiconductor Nanostructures" |
K |
Abstract |
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Full presentation |
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11:50 - 12:10 |
Antonio Garcia-Martin (IMM-CSIC, Spain): "Formation of nanoscale liquid menisci in Electric Fields and Nanofabrication" |
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Abstract |
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Full presentation |
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12:10 - 12:30 |
Hichem Abed (CRMCN/CNRS, France): "Connected Silicon Nanowire Fabrication from CVD
of Silane" |
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Abstract |
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Full presentation |
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12:30 - 14:00 |
Lunch |
14:00 - 14:40 |
Serge Tedesco (CEA, France): "Lithography Roadmap for CMOS manufacturing" |
K |
Abstract |
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Full presentation |
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14:40 - 15:20 |
Boris Chichkov (Laser Zentrum Hannover e.V., Germany): "Maskless, nonlinear, direct-write femtosecond laser lithography and applications" |
K |
Abstract |
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Full presentation |
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15:20 - 16:20 |
Coffee Break - Exhibition |
16:20 - 17:00 |
Hervé Dallaporta (CRMCN/CNRS, France): "Building nanoobject using phenanthrene decomposition induced by focused ion beam" |
K |
Abstract |
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Full presentation |
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17:00 - 17:20 |
Jacques Gierak (LPN-CNRS, France): "Low dose and highly selective patterning with Focused Ion Beams" |
O |
Abstract |
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Full presentation |
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17:20 - 17:40 |
Anna Vilá (University of Barcelona, Spain): "Focused ion beam for charge transport characterization along Si and SiC nanocrystals in SiO2" |
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Abstract |
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Full presentation |
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17:40 - 18:00
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Laurent Roussel (FEI Company, Netherlands): "Nanoprototyping and Nanofabrication using Focused Ion Beam (FIB) and DualBeam Technologies" |
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Abstract |
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Full presentation |
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19:30 |
Welcome Reception - Palais du Pharo |
Scientific Programme - Tuesday 27 |
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09:00 - 09:40 |
Viatcheslav Safarov (CRMCN/CNRS, France): "Semiconductor Spintronics" |
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Abstract |
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Full presentation |
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09:40 - 10:20 |
Eric Minoux (THALES, France): "Electron sources based on carbon nanotubes - application to microwave amplifiers" |
K |
Abstract |
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Full presentation |
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10:20 - 11:10 |
Coffee Break - Exhibition |
11:10 - 11:50 |
Christophe Constancias (CEA-LETI, France): "EUV Lithography at CEA-LETI" |
K |
Abstract |
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Full presentation |
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11:50 - 12:10 |
Pauline Voisin (LTM-CNRS, France): "UV-Nanoimprint process using home-developed resist and multi-scale molds" |
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Abstract |
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Full presentation |
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12:10 - 12:30 |
Jamal Tallal (LTM-CNRS, France): "NIL for dielectrophoresis integration of gold colloids" |
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Abstract |
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Full presentation |
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12:30 - 14:00 |
Lunch |
14:00 - 14:40 |
Dietmar Pum (Center of Nanobiotechnology, Austria): "S-layer based nanostructures" |
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Abstract |
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Full presentation |
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14:40 - 15:20 |
Paolo Facci (S3-INFM-CNR, Italy): "Bio-inspired molecular nanoelectronics" |
K |
Abstract |
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Full presentation |
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15:20 - 15:40 |
Anne Charrier (CRMCN/CNRS, France): "Label free bidimensional colorimetric sensor for the detection of DNA" |
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Abstract |
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Full presentation |
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15:40 - 16:00 |
Nan Wang (University of Oxford, UK): "Dynamic Characterization of Protein Electric Properties Associated with Structure Deformation by Conducting Atomic Force Microscopy" |
O |
Abstract |
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Full presentation |
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16:00 - 16:20 |
Ling Peng (CNRS, France): "How to Effectively Construct Nanoscale RNA/Dendrimer Complexes" |
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Abstract |
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Full presentation |
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16:30 |
Visit of "Frioul Islands" |
Scientific Programme - Wednesday 28 (Industrial Day) |
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09:00 - 09:30 |
Gabriel Crean (Tyndall, Ireland): "From Science to Shares; Technology Transfer & Commercialisation Issues and NanoPhotonics Case Studies" | K |
Abstract |
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Full presentation |
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09:30 - 10:00 |
Yong Chen (CNRS-LPN, France): "Integration of optofluidic and other functionalities" |
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Abstract |
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Full presentation |
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10:00 - 10:30 |
Leslie Carpenter (Dow Corning, UK): "Dow Corning's Take on Photonics" |
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Abstract |
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Full presentation |
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10:30 - 11:00 |
Coffee Break - Poster / Exhibition |
11:00 - 11:30 |
Helmut Bechtel (PHILIPS): "Materials & Nano Optics for Solid State Lighting” |
K |
Abstract |
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Full presentation |
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11:30 - 12:00 |
Jouni Ahopelto (VTT, Finland): "New fabrication methods for photonics” |
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Abstract |
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Full presentation |
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12:00 - 12:30 |
Niko Moll (IBM, Switzerland):"Hybrid Photonic Nano-Structures for Lasing and Switching Applications” |
K |
Abstract |
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Full presentation |
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12:30 - 14:00 |
Lunch |
14:00 - 14:30 |
Cefe Lopez (CSIC-ICMM, Spain): "Advanced 3D photonic crystals structures as challenges: Robot-aided manipulation selfassembly” |
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Abstract |
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Full presentation |
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14:30 - 15:00 |
Rosie Cush (Bookham, UK): "Advanced laser gratings: fabrication and assessment in the production environment" |
K |
Abstract |
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Full presentation |
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15:00 - 15:30 |
Gonçal Badenes (ICFO, Spain): "Patterning of plasmonic structures for (bio) sensing" |
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Abstract |
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Full presentation |
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15:30 - 16:00 |
Coffee Break - Exhibition |
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16:00 - 16:40 |
Roel Gronheid (IMEC, Belgium): "Continued scaling in integrated circuits - Trends and requirements in Lithography" |
K |
Abstract |
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Full presentation |
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16:40 - 17:00 |
Paula Goldschmidt (INTEL, Ireland): "INTEL TME EMEA Operation - Making High Impact technologies happen" |
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Abstract |
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Full presentation |
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17:00 - 17:20 |
Jens Bolten (AMO GmbH, Germany): "Improving the Resolution Limit of Electron Beam Lithography" |
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Abstract |
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Full presentation |
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17:20 - 17:40 |
Frank Nouvertne (Raith GmbH, Germany): "Enabling new in-situ Nanofabrication Experiments using novel Electron and Ion-Beam Lithography and Nanoengineering Workstations" |
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Abstract |
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Full presentation |
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17:40 - 18:00 |
Pascal Gubbini (Molecular Imprints, France): "The Impact of Step and FlashTM Imprint Lithography for
Nano-manufacturing in Emerging Market Applications" |
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Abstract |
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Full presentation |
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21:00 |
Conference Dinner
- Restaurant "Le Ruhl" |
Scientific Programme - Thursday 29 |
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09:00 - 09:20 |
Jouni Ahopelto (VTT, Finland): "NaPa Integrated Project - Emerging Nanopatterning Methods" |
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Abstract |
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Full presentation |
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09:20 - 10:00 |
Helmut Schift (Paul Scherrer Institut, Switzerland): "Nanoimprint in NaPa: Diversity in Materials, Processes and Applications" |
K |
Abstract |
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Full presentation |
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10:00 - 10:20 |
Vincent Reboud (Tyndall National Institute, Ireland): "Spontaneous emission control of colloidal nanocrystals using nanoimprinted
photonic crystals" |
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Abstract |
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Full presentation |
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10:20 - 11:10 |
Coffee Break - Exhibition |
11:10 - 11:30 |
Tapio Makela (VTT Micro and Nanoelectronics, Finland): "Roll to roll nanoimprinting of conducting polyaniline using a novel imprinting device" |
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Abstract |
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Full presentation |
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11:30 - 11:50 |
Mathis Riele (University of Glasgow, UK): "Nanotopography for cell- and tissue engineering" |
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Abstract |
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Full presentation |
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11:50 - 12:10 |
Rasmus Haugstrup Pedersen (MIC, Denmark): "Long-Range Surface Plasmon Polariton Devices
Fabricated by Nanoimprint Lithography" |
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Abstract |
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Full presentation |
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12:10 - 12:30 |
Anders Kristensen (MIC, Denmark): "Nanoimprint lithography fabrication of photonic crystal devices" |
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Abstract |
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Full presentation |
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12:30 - 14:00 |
Lunch |
14:00 - 14:20 |
Ralph Werner (Nanoplus Nanosystems & Technologies, Germany): "Single-mode DBR laser Diodes for gas detection with Grating Structures fabricated by NIL" |
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Abstract |
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Full presentation |
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14:20 - 15:00 |
Heiko Wolf (IBM Research GmbH, Switzerland): "Particle Assembly and Transfer" |
K |
Abstract |
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Full presentation |
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15:00 - 15:20 |
Ulrich Plachetka (AMO GmbH, Germany): "Soft UV-Nanoimprint Lithography" |
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Abstract |
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Full presentation |
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15:20 - 16:00 |
Francesc Perez-Murano (IMB/CSIC, Spain): "Emerging Nanopatterning Methods based on MEMS Technology" |
K |
Abstract |
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Full presentation |
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16:00 - 17:00 |
Coffee Break - Exhibition |
Scientific Programme - Friday 30 |
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09:00 - 09:40 |
Freimut Reuther (Micro Resist Technology GmbH, Germany): "Towards functional polymers for nanoimprint lithography – Strategies and achievements of the NaPa Materials subproject" |
K |
Abstract |
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Full presentation |
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09:40 - 10:00 |
Isabel Obieta (INASMET, Spain): "Plasma treatments of NIL polymers to enhance anti-adhesion properties" |
O |
Abstract |
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Full presentation |
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10:00 - 10:20 |
Maria Lucia Curri (IPCF, Italy): "Colloidal Nanoparticles: Novel Perspective for Nanopatterning" |
O |
Abstract |
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Full presentation |
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10:20 - 10:50 |
Coffee Break |
10:50 - 11:30 |
David Mendels (NPL Management Ltd, United Kingdom): "Multi-scale modelling of nano-imprint lithography" |
K |
Abstract |
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Full presentation |
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11:30 - 12:10 |
Gilbert Lecarpentier (SUSS MicroTec AG, Germany): "Nanoimprinting Stepper with Hot Embossing and UV-NIL Capability" |
K |
Abstract |
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Full presentation |
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12:10 - 12:50 |
Cornelis Wouter Hagen (Delft University of Technology - The Netherlands): "2-20 nm Lithography with
Electron Beam Induced Deposition" |
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Abstract |
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Full presentation |
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12:50 - 13:00 |
Conclusions - LITHO2008 Announcement |
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© Phantoms Foundation 2006 |
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